Photoresist: The Core Game in Semiconductor Manufacturing
Photoresist is one of the most technically challenging materials in semiconductor manufacturing, directly determining chip process precision and yield. In 2026, the global semiconductor photoresist market is projected to exceed USD 5 billion, with a compound annual growth rate of 6.5%. However, the supply chain is highly concentrated — Japanese companies account for over 80% of the global market share, making supply chain security a focus for all nations. For chip manufacturers, selecting reliable semiconductor photoresist suppliers is not merely a technical issue but a strategic one.
Photoresist Classification and Technical Barriers
- G-line/I-line Photoresist (436nm/365nm): Mature process (0.5μm and above), high domestic production rate, priced at ~200-500 RMB/liter
- KrF Photoresist (248nm): Suitable for 130nm-250nm process, only a few domestic manufacturers have mass production capability
- ArF Photoresist (193nm): Suitable for 90nm-14nm process, extremely high technical barrier, only 5-6 global suppliers
- EUV Photoresist (13.5nm): For 7nm and below advanced processes, currently only supplied by Japanese companies such as JSR and Shin-Etsu
2026 Photoresist Market Landscape
The current global semiconductor photoresist manufacturer landscape shows a “one superpower, multiple strong players” pattern:
- JSR (Japan): ~30% global share, absolute leader in ArF/EUV, acquired by Japan’s INCJ
- Shin-Etsu Chemical (Japan): ~22% share, deep technology in KrF/ArF photoresist, excellent material purity control
- TOK (Tokyo Ohka Kogyo, Japan): ~18% share, most complete product line, covering G-line to EUV
- Sumitomo Chemical (Japan): ~10% share, strong competitiveness in KrF photoresist
- Domestic Manufacturers: Nanda Optoelectronics (ArF), Shanghai Sinyang (KrF), Jingrui Electronic (I-line) are accelerating breakthroughs
Photoresist Selection Key Indicators
When evaluating semiconductor photoresist manufacturers, it is recommended to focus on the following technical indicators:
- Resolution: Whether it can meet the line width requirements of the target process (e.g., ArF needs to achieve below 90nm)
- Sensitivity: Lower exposure dose means higher throughput and lower unit cost
- Contrast: Determines pattern edge sharpness, affecting CD uniformity
- Etch Resistance: Ability to maintain pattern fidelity during plasma etching
- Defect Control: Metal impurity content needs to be controlled at ppb level, particles ≤0.05μm
- Batch Consistency: Key parameter fluctuations within the same batch must be controlled within ±3%
Supply Chain Security and Domestic Substitution
Facing geopolitical risks, semiconductor photoresist supply chain security is critical:
- Diversified Procurement: Establish qualified supply systems with at least 2-3 suppliers
- Domestic Verification: Prioritize importing domestic photoresist in mature processes (I-line/KrF), gradually extending to ArF
- Strategic Reserves: Maintain 3-6 months safety stock for critical process photoresist
- Technical Cooperation: Establish joint development mechanisms with photoresist manufacturers for customized formula optimization
Procurement Strategy Recommendations
- Mature Processes: Prioritize importing domestic photoresist, reducing costs by 30-50% while avoiding supply disruption risks
- Advanced Processes: Maintain long-term cooperation with Japanese suppliers while actively participating in domestic ArF photoresist verification
- New Product Development: Sign Joint Development Agreements (JDA) with photoresist manufacturers for customized dedicated formulations
- Cost Optimization: Lock prices through annual framework agreements, negotiate 5-10% discounts for bulk purchases
For semiconductor fabs, 2026 is a pivotal year for photoresist supply chain strategic adjustment. It is recommended to actively promote domestic substitution while ensuring yield, establishing a secure, stable, and competitive photoresist supply system.
Keywords: semiconductor photoresist manufacturers, photoresist, ArF photoresist, domestic substitution
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