Silicon Carbide: The Core Material of Third-Generation Semiconductors
Silicon carbide (SiC), as a representative of third-generation semiconductor materials, is becoming the material of choice for high-end applications such as new energy vehicles, photovoltaic inverters, smart grids, and 5G base stations with its excellent characteristics of wide bandgap (3.26eV), high breakdown field strength (10x that of silicon), and high thermal conductivity (3-4x that of silicon). In 2026, the global SiC power device market is projected to exceed USD 6 billion, and material supply tightness has become the core bottleneck restricting industrial development.
SiC Material Classification and Technology Roadmap
- SiC Substrate: 4H-SiC is the mainstream, 6-inch has become mainstream, 8-inch is in mass production ramp-up
- SiC Epitaxial Wafer: n-type epitaxy (for MOSFET), p-type epitaxy (for diodes), thickness uniformity within ±3%
- SiC Power Devices: SiC SBD (Schottky barrier diode), SiC MOSFET (metal-oxide-semiconductor field-effect transistor)
- SiC Modules: Automotive main drive inverter modules, PV inverter modules, charging modules
2026 SiC Material Market Landscape
The global SiC material supply chain shows a “China-US-Europe” tripod pattern:
- USA: Wolfspeed (formerly Cree) is the world’s largest SiC substrate supplier with ~60% market share; II-VI (now Coherent) ~15% share
- Europe: STMicroelectronics (ST), Infineon, Rohm lead in device field, materials mainly imported from USA
- China: Tianyu Advanced, TankeHeda, Shuoke Crystal and other substrate manufacturers are rising rapidly, 6-inch substrates in mass production, 8-inch R&D progressing smoothly
- Japan: Rohm, Mitsubishi Electric have deep cultivation in SiC devices for many years, high material self-sufficiency rate
SiC Substrate Core Indicators and Selection
When purchasing SiC power device materials, it is recommended to focus on the following indicators:
- Micropipe Density (MPD): ≤1 cm⁻², affects device breakdown voltage and yield
- Dislocation Density: Threading screw dislocation (TSD) ≤500 cm⁻², basal plane dislocation (BPD) ≤2000 cm⁻²
- Resistivity Uniformity: ≤5%, affects epitaxial growth quality and device consistency
- Surface Roughness: Ra≤0.5nm, affects epitaxial layer crystal quality
- Warp: ≤30μm (6-inch), ≤50μm (8-inch), affects device process yield
Price Trends and Supply Status
- 6-inch SiC Substrate: Imported brands (Wolfspeed/II-VI) 8000-15000 RMB/piece; domestic brands (Tianyu/TankeHeda) 5000-10000 RMB/piece
- 6-inch SiC Epitaxial Wafer: Imported 12000-20000 RMB/piece; domestic 8000-15000 RMB/piece
- 8-inch SiC Substrate: Imported 30000-50000 RMB/piece; domestic sample price 20000-35000 RMB/piece
- Supply Status: 6-inch substrate supply tight, lead time 8-12 weeks; 8-inch substrate in sample stage, mass production lead time 16-20 weeks
Procurement Strategy Recommendations
- Diversified Supply: Establish “USA + China” dual supply chain to avoid geopolitical risks
- Long-term Agreements: Sign 2-3 year long-term supply agreements with core suppliers to lock capacity and price
- Domestic Verification: Accelerate domestic SiC substrate/epitaxial wafer verification and import, reducing cost by 30-50%
- Strategic Reserve: Maintain 3-6 months safety stock for critical SiC device models
- Joint Development: Establish joint laboratories with material manufacturers for customized 8-inch SiC material development
Market Trend Outlook
- 8-inch SiC substrates will begin small-batch shipments in H2 2026, mass production in 2027
- Domestic SiC substrate market share will increase from 15% in 2025 to 25% in 2026
- Automotive-grade SiC MOSFET demand explosion, driving 6-inch substrate demand growth 80%+
- SiC and GaN (gallium nitride) will compete in medium-low voltage fields, SiC has obvious advantages in high voltage fields
For new energy vehicle manufacturers, PV inverter manufacturers, and power semiconductor manufacturers, 2026 is a critical year for SiC supply chain strategic layout. It is recommended to establish a secure, efficient, and low-cost SiC material supply system through diversified procurement, domestic verification, long-term agreements, and other means.
Keywords: silicon carbide power devices, SiC substrate, SiC epitaxial wafer, third-generation semiconductors
发表回复